Bio

McIntyre's group performs research on nanostructured inorganic materials for applications in electronics, energy technologies and sensors. He is best known for his work on metal oxide/semiconductor interfaces, ultrathin dielectrics, defects in complex metal oxide thin films, and nanostructured Si-Ge single crystals. His research team synthesizes materials, characterizes their structures and compositions with a variety of advanced microscopies and spectroscopies, studies the passivation of their interfaces, and measures functional properties of devices.

Academic Appointments

Professional Education

  • ScD, MIT (1993)

Contact

2014-15 Courses

Postdoctoral Advisees

Journal Articles

  • EOT Scaling of TiO2/Al2O3 on Germanium pMOSFETs and Impact of Gate Metal Selection IEEE ELECTRON DEVICE LETTERS Zhang, L., Gunji, M., Thombare, S., McIntyre, P. C. 2013; 34 (6): 732-734

    View details for DOI 10.1109/LED.2013.2259137

    View details for Web of Science ID 000319460800005

  • Effect and extraction of series resistance in Al2O3-InGaAs MOS with bulk-oxide trap ELECTRONICS LETTERS Yu, B., Yuan, Y., Chen, H., Ahn, J., McIntyre, P. C., Taur, Y. 2013; 49 (7): 492-493

    View details for DOI 10.1049/el.2013.0433

    View details for Web of Science ID 000318549700035

  • Enhanced Performance and Endurance of -Porous Platinum Solid Oxide Fuel Cell Electrodes by Oxygen Partial Pressure Cycling MRS Comm. Ginestra, C., N., McIntyre, P., C. 2013

    View details for DOI 10.1557/mrc.2013.25

  • New Method for Determining Flat-Band Voltage in High Mobility Semiconductors J. Vac. Sci. Technol. B Winter, R., Ahn, J., McIntyre, P., C., Eizenberg, M. 2013; 31: 30604
  • Arsenic Decapping and Pre-ALD Trimethylaluminum Passivation of Al2O3/InGaAs(100) Interfaces Appl. Phys. Lett. Ahn, J., Kent, T., Chagarov, E., Tang, K., Kummel, A., C., McIntyre, P., C. 2013; 103: 071602-1-4
  • EOT Scaling of TiO2/Al2O3 on Germanium pMOSFETs and Impact of Gate Metal Selection IEEE Electron Dev. Lett. Zhang, L., Gunji, M., Thombare, S., McIntyre, P., C. 2013; 34: 732-34
  • Effect and Extraction of Series Resistance in Al2O3-InGaAs MOS with Bulk-Oxide Trap Electronics Lett. Yu, B., Yuan, Y., Chen, H., P., Ahn, J., McIntyre, P., C., Taur, Y. 2013; 49: 492-93
  • Temperature-dependent capacitance-voltage analysis of defects in Al2O3 gate dielectric stacks on GaN APPLIED PHYSICS LETTERS Long, R. D., Hazeghi, A., Gunji, M., Nishi, Y., McIntyre, P. C. 2012; 101 (24)

    View details for DOI 10.1063/1.4769827

    View details for Web of Science ID 000312490000025

  • Directed synthesis of germanium oxide nanowires by vapor-liquid-solid oxidation NANOTECHNOLOGY Gunji, M., Thombare, S. V., Hu, S., McIntyre, P. C. 2012; 23 (38)

    Abstract

    We report on the directed synthesis of germanium oxide (GeO(x)) nanowires (NWs) by locally catalyzed thermal oxidation of aligned arrays of gold catalyst-tipped germanium NWs. During oxygen anneals conducted above the Au-Ge binary eutectic temperature (T > 361 °C), one-dimensional oxidation of as-grown Ge NWs occurs by diffusion of Ge through the Au-Ge catalyst droplet, in the presence of an oxygen containing ambient. Elongated GeO(x) wires grow from the liquid catalyst tip, consuming the adjoining Ge NWs as they grow. The oxide NWs' diameter is dictated by the catalyst diameter and their alignment generally parallels that of the growth direction of the initial Ge NWs. Growth rate comparisons reveal a substantial oxidation rate enhancement in the presence of the Au catalyst. Statistical analysis of GeO(x) nanowire growth by ex situ transmission electron microscopy and scanning electron microscopy suggests a transition from an initial, diameter-dependent kinetic regime, to diameter-independent wire growth. This behavior suggests the existence of an incubation time for GeO(x) NW nucleation at the start of vapor-liquid-solid oxidation.

    View details for DOI 10.1088/0957-4484/23/38/385603

    View details for Web of Science ID 000308813100019

    View details for PubMedID 22947505

  • Interface-State Modeling of Al2O3-InGaAs MOS From Depletion to Inversion IEEE TRANSACTIONS ON ELECTRON DEVICES Chen, H., Yuan, Y., Yu, B., Ahn, J., McIntyre, P. C., Asbeck, P. M., Rodwell, M. J., Taur, Y. 2012; 59 (9): 2383-2389

    View details for DOI 10.1109/TED.2012.2205255

    View details for Web of Science ID 000307905200017

  • Size effects in vapor-solid-solid Ge nanowire growth with a Ni-based catalyst JOURNAL OF APPLIED PHYSICS Thombare, S. V., Marshall, A. F., McIntyre, P. C. 2012; 112 (5)

    View details for DOI 10.1063/1.4749797

    View details for Web of Science ID 000309072200138

  • A Distributed Bulk-Oxide Trap Model for Al2O3 InGaAs MOS Devices IEEE TRANSACTIONS ON ELECTRON DEVICES Yuan, Y., Yu, B., Ahn, J., McIntyre, P. C., Asbeck, P. M., Rodwell, M. J., Taur, Y. 2012; 59 (8): 2100-2106

    View details for DOI 10.1109/TED.2012.2197000

    View details for Web of Science ID 000306920200015

  • Direct-gap photoluminescence from germanium nanowires PHYSICAL REVIEW B Kawamura, Y., Huang, K. C., Thombare, S. V., Hu, S., Gunji, M., Ishikawa, T., Brongersma, M. L., Itoh, K. M., McIntyre, P. C. 2012; 86 (3)

    View details for DOI 10.1103/PhysRevB.86.035306

    View details for Web of Science ID 000306189300005

  • Surface Preparation and Deposited Gate Oxides for Gallium Nitride Based Metal Oxide Semiconductor Devices MATERIALS Long, R. D., McIntyre, P. C. 2012; 5 (7): 1297-1335

    View details for DOI 10.3390/ma5071297

    View details for Web of Science ID 000306750400011

  • Thermal Stability and Surface Passivation of Ge Nanowires Coated by Epitaxial SiGe Shells NANO LETTERS Hu, S., Kawamura, Y., Huang, K. C., Li, Y., Marshall, A. F., Itoh, K. M., Brongersma, M. L., McIntyre, P. C. 2012; 12 (3): 1385-1391

    Abstract

    Epitaxial growth of a highly strained, coherent SiGe alloy shell around a Ge nanowire core is investigated as a method to achieve surface passivation and carrier confinement, important in realizing nanowire devices. The high photoluminescence intensity observed from the core-shell nanowires with spectral features similar to that of bulk Ge indicates effective surface passivation. Thermal stability of these core-shell heterostructures has been systematically investigated, with a method demonstrated to avoid misfit strain relaxation during postgrowth annealing.

    View details for DOI 10.1021/nl204053w

    View details for Web of Science ID 000301406800046

    View details for PubMedID 22364183

  • Nucleation and growth kinetics during metal-induced layer exchange crystallization of Ge thin films at low temperatures JOURNAL OF APPLIED PHYSICS Hu, S., McIntyre, P. C. 2012; 111 (4)

    View details for DOI 10.1063/1.3682110

    View details for Web of Science ID 000300948600130

  • Erratum: Charged Defect Quantification in Pt/Al2O3/In0.53Ga0.47As/InP MOS Capacitors (vol 158, pg G103, 2011) JOURNAL OF THE ELECTROCHEMICAL SOCIETY Long, R. D., Shin, B., Monaghan, S., Cherkaoui, K., Cagnon, J., Stemmer, S., McIntyre, P. C., Hurley, P. K. 2012; 159 (6): S17-S17

    View details for DOI 10.1149/2.119206jes

    View details for Web of Science ID 000304140700092

  • Interface-State Modeling of Al2O3–InGaAs MOS From Depletion to Inversion IEEE Trans. Electron Dev. Chen, H., P., Yuan, Y., Yu, B., Ahn, J., McIntyre, P., C., Asbeck, P., M. 2012; 59: 2383-89
  • Titania/alumina bilayer gate insulators for InGaAs metal-oxide-semiconductor devices APPLIED PHYSICS LETTERS Ahn, J., Geppert, I., Gunji, M., Holland, M., Thayne, I., Eizenberg, M., McIntyre, P. C. 2011; 99 (23)

    View details for DOI 10.1063/1.3662966

    View details for Web of Science ID 000298006100054

  • Ultrathin ALD-Al2O3 layers for Ge(001) gate stacks: Local composition evolution and dielectric properties JOURNAL OF APPLIED PHYSICS Swaminathan, S., Sun, Y., Pianetta, P., McIntyre, P. C. 2011; 110 (9)

    View details for DOI 10.1063/1.3647761

    View details for Web of Science ID 000297062100087

  • Introduction JOURNAL OF MATERIALS RESEARCH McIntyre, P. C., Schmidt, V., Picraux, T., Quitoriano, N., Riel, H., Thelander, C., Thompson, C. 2011; 26 (17): 2125-2126

    View details for DOI 10.1557/jmr.2011.235

    View details for Web of Science ID 000296083100001

  • Mobile Ferroelastic Domain Walls in Nanocrystalline PZT Films: the Direct Piezoelectric Effect ADVANCED FUNCTIONAL MATERIALS Zednik, R. J., Varatharajan, A., Oliver, M., Valanoor, N., McIntyre, P. C. 2011; 21 (16): 3104-3110

    View details for DOI 10.1002/adfm.201100445

    View details for Web of Science ID 000294166200011

  • Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation NATURE MATERIALS Chen, Y. W., Prange, J. D., Duehnen, S., Park, Y., Gunji, M., Chidsey, C. E., McIntyre, P. C. 2011; 10 (7): 539-544

    Abstract

    A leading approach for large-scale electrochemical energy production with minimal global-warming gas emission is to use a renewable source of electricity, such as solar energy, to oxidize water, providing the abundant source of electrons needed in fuel synthesis. We report corrosion-resistant, nanocomposite anodes for the oxidation of water required to produce renewable fuels. Silicon, an earth-abundant element and an efficient photovoltaic material, is protected by atomic layer deposition (ALD) of a highly uniform, 2 nm thick layer of titanium dioxide (TiO(2)) and then coated with an optically transmitting layer of a known catalyst (3 nm iridium). Photoelectrochemical water oxidation was observed to occur below the reversible potential whereas dark electrochemical water oxidation was found to have low-to-moderate overpotentials at all pH values, resulting in an inferred photovoltage of ~550 mV. Water oxidation is sustained at these anodes for many hours in harsh pH and oxidative environments whereas comparable silicon anodes without the TiO(2) coating quickly fail. The desirable electrochemical efficiency and corrosion resistance of these anodes is made possible by the low electron-tunnelling resistance (<0.006 ? cm(2) for p(+)-Si) and uniform thickness of atomic-layer deposited TiO(2).

    View details for DOI 10.1038/NMAT3047

    View details for Web of Science ID 000291969500020

    View details for PubMedID 21685904

  • A Distributed Model for Border Traps in Al2O3 - InGaAs MOS Devices IEEE ELECTRON DEVICE LETTERS Yuan, Y., Wang, L., Yu, B., Shin, B., Ahn, J., McIntyre, P. C., Asbeck, P. M., Rodwell, M. J., Taur, Y. 2011; 32 (4): 485-487

    View details for DOI 10.1109/LED.2011.2105241

    View details for Web of Science ID 000288664800019

  • Electron Mobility in Surface- and Buried-Channel Flatband In0.53Ga0.47As MOSFETs With ALD Al2O3 Gate Dielectric IEEE ELECTRON DEVICE LETTERS Bentley, S. J., Holland, M., Li, X., Paterson, G. W., Zhou, H., Ignatova, O., Macintyre, D., Thoms, S., Asenov, A., Shin, B., Ahn, J., McIntyre, P. C., Thayne, I. G. 2011; 32 (4): 494-496

    View details for DOI 10.1109/LED.2011.2107876

    View details for Web of Science ID 000288664800022

  • Inelastic electron tunneling study of crystallization effects and defect energies in hafnium oxide gate dielectrics APPLIED PHYSICS LETTERS Kim, E. J., Shandalov, M., Saraswat, K. C., McIntyre, P. C. 2011; 98 (3)

    View details for DOI 10.1063/1.3527977

    View details for Web of Science ID 000286471100026

  • Morphological Stability of Mesoporous Pt Thin Films Deposited via Nanosphere Lithography on YSZ (vol 14, pg B96, 2011) ELECTROCHEMICAL AND SOLID STATE LETTERS Lin, A. Y., McIntyre, P. C. 2011; 14 (11): S9-S9

    View details for DOI 10.1149/2.010111esl

    View details for Web of Science ID 000295284800025

  • Strain relaxation mechanisms in compressively strained thin SiGe-on-insulator films grown by selective Si oxidation JOURNAL OF APPLIED PHYSICS Gunji, M., Marshall, A. F., McIntyre, P. C. 2011; 109 (1)

    View details for DOI 10.1063/1.3506420

    View details for Web of Science ID 000286219300130

  • Morphological Stability of Mesoporous Pt Thin Films Deposited via Nanosphere Lithography on YSZ ELECTROCHEMICAL AND SOLID STATE LETTERS Lin, A. Y., McIntyre, P. C. 2011; 14 (10): B96-B99

    View details for DOI 10.1149/1.3609257

    View details for Web of Science ID 000295211600008

  • Charged Defect Quantification in Pt/Al2O3/In0.53Ga0.47As/InP MOS Capacitors JOURNAL OF THE ELECTROCHEMICAL SOCIETY Long, R. D., Shin, B., Monaghan, S., Cherkaoui, K., Cagnon, J., Stemmer, S., McIntyre, P. C., Hurley, P. K. 2011; 158 (5): G103-G107

    View details for DOI 10.1149/1.3545799

    View details for Web of Science ID 000288867700071

  • The changing landscape of conservation science funding in the United States CONSERVATION LETTERS Bakker, V. J., Baum, J. K., Brodie, J. F., Salomon, A. K., Dickson, B. G., Gibbs, H. K., Jensen, O. P., McIntyre, P. B. 2010; 3 (6): 435-444

    View details for DOI 10.1111/j.1755-263X.2010.00125.x

    View details for Web of Science ID 000284893700008

  • Modified phonon confinement model for Raman spectroscopy of nanostructured materials PHYSICAL REVIEW B Roodenko, K., Goldthorpe, I. A., McIntyre, P. C., Chabal, Y. J. 2010; 82 (11)

    View details for DOI 10.1103/PhysRevB.82.115210

    View details for Web of Science ID 000282007600004

  • Hexagonal Close-Packed Structure of Au Nanocatalysts Solidified after Ge Nanowire Vapor-Liquid-Solid Growth NANO LETTERS Marshall, A. F., Goldthorpe, I. A., Adhikari, H., Koto, M., Wang, Y., Fu, L., Olsson, E., McIntyre, P. C. 2010; 10 (9): 3302-3306

    Abstract

    We report that approximately 10% of the Au catalysts that crystallize at the tips of Ge nanowires following growth have the close-packed hexagonal crystal structure rather than the equilibrium face-centered-cubic structure. Transmission electron microscopy results using aberration-corrected imaging, and diffraction and compositional analyses, confirm the hexagonal phase in these 40-50 nm particles. Reports of hexagonal close packing in Au, even in nanoparticle form, are rare, and the observations suggest metastable pathways for the crystallization process. These results bring new considerations to the stabilization of the liquid eutectic alloy at low temperatures that allows for vapor-liquid-solid growth of high quality, epitaxial Ge nanowires below the eutectic temperature.

    View details for DOI 10.1021/nl100913d

    View details for Web of Science ID 000281498200014

    View details for PubMedID 20687570

  • High temperature electrical conduction in nanoscale hafnia films under varying oxygen partial pressure APPLIED PHYSICS LETTERS Ko, C., Shandalov, M., McIntyre, P. C., Ramanathan, S. 2010; 97 (8)

    View details for DOI 10.1063/1.3482940

    View details for Web of Science ID 000281306500032

  • Interface-controlled layer exchange in metal-induced crystallization of germanium thin films APPLIED PHYSICS LETTERS Hu, S., Marshall, A. F., McIntyre, P. C. 2010; 97 (8)

    View details for DOI 10.1063/1.3480600

    View details for Web of Science ID 000281306500034

  • Arsenic decapping and half cycle reactions during atomic layer deposition of Al2O3 on In0.53Ga0.47As(001) APPLIED PHYSICS LETTERS Shin, B., Clemens, J. B., Kelly, M. A., Kummel, A. C., McIntyre, P. C. 2010; 96 (25)

    View details for DOI 10.1063/1.3452336

    View details for Web of Science ID 000279168100045

  • Gold-Catalyzed Vapor-Liquid-Solid Germanium-Nanowire Nucleation on Porous Silicon SMALL Koto, M., Marshall, A. F., Goldthorpe, I. A., McIntyre, P. C. 2010; 6 (9): 1032-1037

    Abstract

    Nanoporous Si(111) substrates are used to study the effects of Au catalyst coarsening on the nucleation of vapor-liquid-solid-synthesized epitaxial Ge nanowires (NWs) at temperatures less than 400 degrees C. Porous Si substrates, with greater effective interparticle separations for Au surface diffusion than nonporous Si, inhibit catalyst coarsening and agglomeration prior to NW nucleation. This greatly reduces the variation in wire diameter and length and increases the yield compared to nucleation on identically prepared nonporous Si substrates.

    View details for DOI 10.1002/smll.200901764

    View details for Web of Science ID 000278437500008

    View details for PubMedID 20411571

  • Origin and passivation of fixed charge in atomic layer deposited aluminum oxide gate insulators on chemically treated InGaAs substrates APPLIED PHYSICS LETTERS Shin, B., Weber, J. R., Long, R. D., Hurley, P. K., Van de Walle, C. G., McIntyre, P. C. 2010; 96 (15)

    View details for DOI 10.1063/1.3399776

    View details for Web of Science ID 000276794100054

  • Bilayer metal oxide gate insulators for scaled Ge-channel metal-oxide-semiconductor devices APPLIED PHYSICS LETTERS Swaminathan, S., Shandalov, M., Oshima, Y., McIntyre, P. C. 2010; 96 (8)

    View details for DOI 10.1063/1.3313946

    View details for Web of Science ID 000275027200064

  • Group IV semiconductor nanowire arrays: epitaxy in different contexts SEMICONDUCTOR SCIENCE AND TECHNOLOGY McIntyre, P. C., Adhikari, H., Goldthorpe, I. A., Hu, S., Leu, P. W., Marshall, A. F., Chidsey, C. E. 2010; 25 (2)

    View details for DOI 10.1088/0268-1242/25/2/024016

    View details for Web of Science ID 000273852300017

  • Border traps in Al2O3/In0.53Ga0.47As (100) gate stacks and their passivation by hydrogen anneals APPLIED PHYSICS LETTERS Kim, E. J., Wang, L., Asbeck, P. M., Saraswat, K. C., McIntyre, P. C. 2010; 96 (1)

    View details for DOI 10.1063/1.3281027

    View details for Web of Science ID 000273473200037

  • Titania/Alumina Bilayer Gate Dielectrics for Ge MOS Devices: Frequency- and Temperature-Dependent Electrical Characteristics ELECTROCHEMICAL AND SOLID STATE LETTERS Swaminathan, S., McIntyre, P. C. 2010; 13 (9): G79-G82

    View details for DOI 10.1149/1.3457480

    View details for Web of Science ID 000279806700016

  • Gold-Catalyzed Vapor–Liquid–Solid Germanium-Nanowire Nucleation on Porous Silicon Small Koto, M., Marshall, A., F., Goldthorpe, I., A., McIntyre, P., C. 2010; 6: 1032-37
  • Arsenic Decapping and Half-Cycle Reactions during Atomic Layer Deposition of Al2O3 on In0.53Ga0.47As (001) Appl. Phys. Lett. Shin, B., Clemens, J., B., Kelly, M., A., Kummel, A., C., McIntyre, P., C. 2010; 96: 252907-1-3
  • Atomic Layer Deposited Hafnium Oxide Gate Dielectrics for Charge-Based Biosensors ELECTROCHEMICAL AND SOLID STATE LETTERS Chen, Y. W., Liu, M., Kaneko, T., McIntyre, P. C. 2010; 13 (3): G29-G32

    View details for DOI 10.1149/1.3280224

    View details for Web of Science ID 000273690400014

  • Atomically abrupt and unpinned Al2O3/In0.53Ga0.47As interfaces: Experiment and simulation JOURNAL OF APPLIED PHYSICS Kim, E. J., Chagarov, E., Cagnon, J., Yuan, Y., Kummel, A. C., Asbeck, P. M., Stemmer, S., Saraswat, K. C., McIntyre, P. C. 2009; 106 (12)

    View details for DOI 10.1063/1.3266006

    View details for Web of Science ID 000273216500098

  • Thermal Properties of Ultrathin Hafnium Oxide Gate Dielectric Films IEEE ELECTRON DEVICE LETTERS Panzer, M. A., Shandalov, M., Rowlette, J. A., Oshima, Y., Chen, Y. W., McIntyre, P. C., Goodson, K. E. 2009; 30 (12): 1269-1271

    View details for DOI 10.1109/LED.2009.2032937

    View details for Web of Science ID 000272044500007

  • Inhibiting Strain-Induced Surface Roughening: Dislocation-Free Ge/Si and Ge/SiGe Core-Shell Nanowires NANO LETTERS Goldthorpe, I. A., Marshall, A. F., McIntyre, P. C. 2009; 9 (11): 3715-3719

    Abstract

    Elastic strain is a critical factor in engineering the electronic behavior of core-shell semiconductor nanowires and provides the driving force for undesirable surface roughening and defect formation. We demonstrate two independent strategies, chlorine surface passivation and growth of nanowires with low-energy sidewall facets, to avoid strain-induced surface roughening that promotes dislocation nucleation in group IV core-shell nanowires. Metastably strained, dislocation-free, core-shell nanowires are obtained, and axial strains are measured and compared to elasticity model predictions.

    View details for DOI 10.1021/nl9018148

    View details for Web of Science ID 000271566400009

    View details for PubMedID 19795838

  • In0.53Ga0.47As Channel MOSFETs With Self-Aligned InAs Source/Drain Formed by MEE Regrowth IEEE ELECTRON DEVICE LETTERS Singisetti, U., Wistey, M. A., Burek, G. J., Baraskar, A. K., Thibeault, B. J., Gossard, A. C., Rodwell, M. J., Shin, B., Kim, E. J., McIntyre, P. C., Yu, B., Yuan, Y., Wang, D., Taur, Y., Asbeck, P., Lee, Y. 2009; 30 (11): 1128-1130

    View details for DOI 10.1109/LED.2009.2031304

    View details for Web of Science ID 000271151500004

  • Size-dependent polymorphism in HfO2 nanotubes and nanoscale thin films JOURNAL OF APPLIED PHYSICS Shandalov, M., McIntyre, P. C. 2009; 106 (8)

    View details for DOI 10.1063/1.3243077

    View details for Web of Science ID 000271358100097

  • Single-crystal germanium layers grown on silicon by nanowire seeding NATURE NANOTECHNOLOGY Hu, S., Leu, P. W., Marshall, A. F., McIntyre, P. C. 2009; 4 (10): 649-653

    Abstract

    Three-dimensional integration and the combination of different material systems are central themes of electronics research. Recently, as-grown vertical one-dimensional structures have been integrated into high-density three-dimensional circuits. However, little attention has been paid to the unique structural properties of germanium nanowires obtained by epitaxial and heteroepitaxial growth on Ge(111) and Si(111) substrates, despite the fact that the integration of germanium on silicon is attractive for device applications. Here, we demonstrate the lateral growth of single crystal germanium islands tens of micrometres in diameter by seeding from germanium nanowires grown on a silicon substrate. Vertically aligned high-aspect-ratio nanowires can transfer the orientation and perfection of the substrate crystal to overlying layers a micrometre or more above the substrate surface. This technique can be repeated to build multiple active device layers, a key requirement for the fabrication of densely interconnected three-dimensional integrated circuits.

    View details for DOI 10.1038/nnano.2009.233

    View details for Web of Science ID 000270513900016

    View details for PubMedID 19809455

  • Gold Removal from Germanium Nanowires LANGMUIR Ratchford, J. B., Goldthorpe, I. A., Sun, Y., McIntyre, P. C., Pianetta, P. A., Chidsey, C. E. 2009; 25 (16): 9473-9479

    Abstract

    We report the selective removal of gold from the tips of germanium nanowires (GeNWs) grown by chemical vapor deposition on gold nanoparticles (AuNPs). Selective removal was accomplished by aqueous hydrochloric acid solutions containing either potassium triiodide or iodine. Measurement of the residual number of gold atoms on the GeNW samples using inductively coupled plasma-mass spectrometry shows that 99% of the gold was removed. Photoemission spectroscopy shows that the germanium surfaces of these samples were not further oxidized after treatment with these liquid etchants. Auger electron spectroscopy shows that AuNPs that did not yield GeNWs contain germanium and also that the addition of gaseous HCl to GeH(4) during GeNW growth increased the selectivity of germanium deposition to the AuNPs.

    View details for DOI 10.1021/la900725b

    View details for Web of Science ID 000268719900088

    View details for PubMedID 19419180

  • Oxidant prepulsing of Ge (100) prior to atomic layer deposition of Al2O3: In situ surface characterization APPLIED PHYSICS LETTERS Swaminathan, S., Oshima, Y., Kelly, M. A., McIntyre, P. C. 2009; 95 (3)

    View details for DOI 10.1063/1.3177195

    View details for Web of Science ID 000268405300051

  • Atomic Layer Deposition of Dielectrics on Ge and III-V Materials for Ultrahigh Performance Transistors MRS BULLETIN Wallace, R. M., McIntyre, P. C., Kim, J., Nishi, Y. 2009; 34 (7): 493-503

    View details for Web of Science ID 000268159400015

  • Hafnium oxide/germanium oxynitride gate stacks on germanium: Capacitance scaling and interface state density APPLIED PHYSICS LETTERS Oshima, Y., Shandalov, M., Sun, Y., Pianetta, P., McIntyre, P. C. 2009; 94 (18)

    View details for DOI 10.1063/1.3116624

    View details for Web of Science ID 000265933700046

  • High-quality III-V semiconductor MBE growth on Ge/Si virtual substrates for metal-oxide-semiconductor device fabrication JOURNAL OF CRYSTAL GROWTH Choi, D., Harris, J. S., Kim, E., McIntyre, P. C., Cagnon, J., Stemmer, S. 2009; 311 (7): 1962-1971

    View details for DOI 10.1016/j.jcrysgro.2008.09.138

    View details for Web of Science ID 000265659300083

  • Growth of germanium crystals from electrodeposited gold in local crucibles APPLIED PHYSICS LETTERS Ratchford, J. B., Goldthorpe, I. A., McIntyre, P. C., Chidsey, C. E. 2009; 94 (4)

    View details for DOI 10.1063/1.3074363

    View details for Web of Science ID 000262971800124

  • Vertical Germanium Nanowire Arrays in Microfluidic Channels for Charged Molecule Detection JOURNAL OF THE ELECTROCHEMICAL SOCIETY Koto, M., Leu, P. W., McIntyre, P. C. 2009; 156 (2): K11-K16

    View details for DOI 10.1149/1.3033522

    View details for Web of Science ID 000261973600052

  • Interface Studies of ALD-Grown Metal Oxide Insulators on Ge and III–V Semiconductors Microelectron. Engineering McIntyre, P., C., Oshima, Y., Kim, E., Saraswat, K., C. 2009; 86: 1536–39
  • High-Quality III–V Semiconductor MBE Growth on Ge/Si Virtual Substrates for Metal-Oxide-Semiconductor Device Fabrication J. Crystal Growth Choi, D., Harris, J., S., Kim, E., McIntyre, P., C., Cagnon, J., Stemmer, S. 2009; 311: 1962-71
  • Unpinned Interface Between Al2O3 Gate Dielectric Layer Grown by AtomicLayer Deposition and Chemically Treated n-In0.53Ga0.47As (001) Electrochem. Solid-State Lett. Shin, B., Cagnon, J., Long, R., D., Hurley, P., K., Stemmer, S., McIntyre, P., C. 2009; 12: G40-43
  • Atomically Abrupt and Unpinned Al2O3/ In0.53Ga0.47As Interfaces: Experiment and Simulation J. Appl. Phys. Kim, E., J., Chagarov, E., Cagnon, J., Yuan, Y., Kummel, A., C., Asbeck, P., M., McIntyre, P. 2009; 106: 124508-1-8
  • Unpinned Interface Between Al2O3 Gate Dielectric Layer Grown by Atomic Layer Deposition and Chemically Treated n-In0.53Ga0.47As(001) ELECTROCHEMICAL AND SOLID STATE LETTERS Shin, B., Cagnon, J., Long, R. D., Hurley, P. K., Stemmer, S., McIntyre, P. C. 2009; 12 (8): G40-G43

    View details for DOI 10.1149/1.3139603

    View details for Web of Science ID 000266975000013

  • Oxide-encapsulated vertical germanium nanowire structures and their DC transport properties NANOTECHNOLOGY Leu, P. W., Adhikari, H., Koto, M., Kim, K., de Rouffignac, P., Marshall, A. F., Gordon, R. G., Chidsey, C. E., McIntyre, P. C. 2008; 19 (48)

    Abstract

    We demonstrate the p-type doping of Ge nanowires (NWs) and p-n junction arrays in a scalable vertically aligned structure with all processing performed below 400?°C. These structures are advantageous for the large scale production of parallel arrays of devices for nanoelectronics and sensing applications. Efficient methods for the oxide encapsulation, chemical mechanical polishing and cleaning of vertical Ge NWs embedded in silicon dioxide are reported. Approaches for avoiding the selective oxidation and dissolution of Ge NWs in aqueous solutions during chemical mechanical polishing and cleaning of oxide-encapsulated Ge NWs are emphasized. NWs were doped through the epitaxial deposition of a B-doped shell and transport measurements indicate doping concentrations on the order of 10(19) cm(-3).

    View details for DOI 10.1088/0957-4484/19/48/485705

    View details for Web of Science ID 000260859400022

    View details for PubMedID 21836312

  • Synthesis and Strain Relaxation of Ge-Core/Si-Shell Nanowire Arrays NANO LETTERS Goldthorpe, I. A., Marshall, A. F., McIntyre, P. C. 2008; 8 (11): 4081-4086

    Abstract

    Analogous to planar heteroepitaxy, misfit dislocation formation and stress-driven surface roughening can relax coherency strains in misfitting core-shell nanowires. The effects of coaxial dimensions on strain relaxation in aligned arrays of Ge-core/Si-shell nanowires are analyzed quantitatively by transmission electron microscopy and synchrotron X-ray diffraction. Relating these results to reported continuum elasticity models for coaxial nanowire heterostructures provides valuable insights into the observed interplay of roughening and dislocation-mediated strain relaxation.

    View details for DOI 10.1021/nl802408y

    View details for Web of Science ID 000260888600094

    View details for PubMedID 18954126

  • Analysis of electrically biased paramagnetic defect centers in HfO2 and HfxSi1-xO2/(100)Si interfaces JOURNAL OF APPLIED PHYSICS Chen, P. T., Triplett, B. B., Chambers, J. J., Colombo, L., McIntyre, P. C., Nishi, Y. 2008; 104 (1)

    View details for DOI 10.1063/1.2948922

    View details for Web of Science ID 000257766500104

  • Morphological instability of misfit-strained core-shell nanowires PHYSICAL REVIEW B Schmidt, V., McIntyre, P. C., Goesele, U. 2008; 77 (23)

    View details for DOI 10.1103/PhysRevB.77.235302

    View details for Web of Science ID 000257289500069

  • Molecular-beam epitaxial growth of III-V semiconductors on Ge/Si for metal-oxide-semiconductor device fabrication APPLIED PHYSICS LETTERS Choi, D., Kim, E., McIntyre, P. C., Harris, J. S. 2008; 92 (20)

    View details for DOI 10.1063/1.2929386

    View details for Web of Science ID 000256196600093

  • Silicon-germanium interdiffusion in high-germanium-content epitaxial heterostructures APPLIED PHYSICS LETTERS Ozguven, N., McIntyre, P. C. 2008; 92 (18)

    View details for DOI 10.1063/1.2917798

    View details for Web of Science ID 000256485700022

  • Ge-interface engineering with ozone oxidation for low interface-state density IEEE ELECTRON DEVICE LETTERS Kuzum, D., Krishnamohan, T., Pethe, A. J., Okyay, A. K., Oshima, Y., Sun, Y., McVittie, J. P., Pianetta, P. A., McIntyre, P. C., Saraswat, K. C. 2008; 29 (4): 328-330

    View details for DOI 10.1109/LED.2008.918272

    View details for Web of Science ID 000254225800015

  • HfO2 gate dielectric on (NH4)(2)S passivated (100) GaAs grown by atomic layer deposition JOURNAL OF APPLIED PHYSICS Chen, P. T., Sun, Y., Kim, E., McIntyre, P. C., Tsai, W., GARNER, M., Pianetta, P., Nishi, Y., Chui, C. O. 2008; 103 (3)

    View details for DOI 10.1063/1.2838471

    View details for Web of Science ID 000253238100054

  • Atomic Layer Deposition of Hafnium Oxide on Ge and GaAs Substrates: Precursors and Surface Preparation JOURNAL OF THE ELECTROCHEMICAL SOCIETY Delabie, A., Brunco, D. P., Conard, T., Favia, P., Bender, H., Franquet, A., Sioncke, S., Vandervorst, W., Van Elshocht, S., Heyns, M., Meuris, M., Kim, E., McIntyre, P. C., Saraswat, K. C., LeBeau, J. M., Cagnon, J., Stemmer, S., Tsai, W. 2008; 155 (12): H937-H944

    View details for DOI 10.1149/1.2979144

    View details for Web of Science ID 000260479700068

  • Chemical Bonding, Interfaces, and Defects in Hafnium Oxide/Germanium Oxynitride Gate Stacks on Ge(100) J. Electrochem. Soc. Oshima, Y., Sun, Y., Kuzum, D., Sugawara, T., Saraswat, K., C., Pianetta, P., McIntyre, P. 2008; 155: G304-09
  • HfO2 Gate Dielectric on (NH4)2S Passivated (100) GaAs Grown by Atomic Layer Deposition J. Appl. Phys. Chen, P., T., Sun, Y., Kim, E., McIntyre, P., C., Tsai, W., Garner, M. 2008; 103: 34106
  • Analysis of Electrically Biased Paramagnetic Defect Centers in HfO2 and HfxSi1−xO2 /(100) Si Interfaces J. Appl. Phys. Chen, P., T., Triplett, B., B., Chambers, J., J., Colombo, L., McIntyre, P., C., Nishi, Y. 2008; 104: 14106
  • Pre-Atomic Layer Deposition Surface Cleaning and Chemical Passivation of (100) In0.2Ga0.8As and Deposition of Ultrathin Al2O3 Gate insulators Appl. Phys. Lett. Shin, B., Choi, D., Harris, J., S., McIntyre, P., C. 2008; 93: 052911-1-3
  • Selective oxidation of SiGe alloys: A route to Ge-on-insulator structures with controlled biaxial strain ELECTROCHEMICAL AND SOLID STATE LETTERS Ozguven, N., McIntyre, P. C. 2008; 11 (6): H138-H142

    View details for DOI 10.1149/1.2896080

    View details for Web of Science ID 000255117500022

  • Effects of chemical stability of platinum/lead zirconate titanate and iridium oxide/lead zirconate titanate interfaces on ferroelectric thin film switching reliability APPLIED PHYSICS LETTERS Chen, Y., McIntyre, P. C. 2007; 91 (23)

    View details for DOI 10.1063/1.2822419

    View details for Web of Science ID 000251450600074

  • Metastability of Au-Ge liquid nanocatalysts: Ge vapor-liquid-solid nanowire growth far below the bulk eutectic temperature ACS NANO Adhikari, H., Marshall, A. F., Goldthorpe, I. A., Chidsey, C. E., McIntyre, P. C. 2007; 1 (5): 415-422

    Abstract

    The vapor-liquid-solid mechanism of nanowire (NW) growth requires the presence of a liquid at one end of the wire; however, Au-catalyzed Ge nanowire growth by chemical vapor deposition can occur at approximately 100 degrees C below the bulk Au-Ge eutectic. In this paper, we investigate deep sub-eutectic stability of liquid Au-Ge catalysts on Ge NWs quantitatively, both theoretically and experimentally. We construct a binary Au-Ge phase diagram that is valid at the nanoscale and show that equilibrium arguments, based on capillarity, are inconsistent with stabilization of Au-Ge liquid at deep sub-eutectic temperatures, similar to those used in Ge NW growth. Hot-stage electron microscopy and X-ray diffraction are used to test the predictions of nanoscale phase equilibria. In addition to Ge supersaturation of the Au-Ge liquid droplet, which has recently been invoked as an explanation for deep sub-eutectic Ge NW growth, we find evidence of a substantial kinetic barrier to Au solidification during cooling below the nanoscale Au-Ge eutectic temperature.

    View details for DOI 10.1021/nn7001486

    View details for Web of Science ID 000252022900011

    View details for PubMedID 19206662

  • Conditions for subeutectic growth of Ge nanowires by the vapor-liquid-solid mechanism JOURNAL OF APPLIED PHYSICS Adhikari, H., McIntyre, P. C., Marshall, A. F., Chidsey, C. E. 2007; 102 (9)

    View details for DOI 10.1063/1.2803893

    View details for Web of Science ID 000250983700084

  • Lead zirconate titanate ferroelectric thin film capacitors: Effects of surface treatments on ferroelectric properties APPLIED PHYSICS LETTERS Chen, Y., McIntyre, P. C. 2007; 91 (7)

    View details for DOI 10.1063/1.2769394

    View details for Web of Science ID 000248866600083

  • Vertically oriented germanium nanowires grown from gold colloids on silicon substrates and subsequent gold removal NANO LETTERS Woodruff, J. H., Ratchford, J. B., Goldthorpe, I. A., McIntyre, P. C., Chidsey, C. E. 2007; 7 (6): 1637-1642

    Abstract

    A linker-free method to deposit citrate-stabilized Au colloids onto hydrogen-terminated Si by acidifying the Au colloid solution with HF or HCl is presented. This method prevents oxide formation and provides a model system for studying orientation control of nanowires by epitaxy. Conditions are reported that result in vertically oriented Ge nanowires of uniform diameter and length on Si(111). We then present a method to remove Au catalysts from the nanowires with aqueous triiodide and HCl.

    View details for DOI 10.1021/nl070595x

    View details for Web of Science ID 000247186800037

    View details for PubMedID 17530912

  • Effect of Y doping and composition-dependent elastic strain on the electrical properties of (Ba,Sr)TiO3 thin films deposited at 520 degrees C (vol 87, art no 192906, 2005) APPLIED PHYSICS LETTERS Wang, R., McIntyre, P. C., Baniecki, J. D., Nomura, K., Shioga, T., Kurihara, K., Ishii, M. 2007; 90 (19)

    View details for DOI 10.1063/1.2735541

    View details for Web of Science ID 000246413400108

  • Relaxorlike dielectric behavior in Ba0.7Sr0.3TiO3 thin films JOURNAL OF APPLIED PHYSICS Zednika, R. J., McIntyre, P. C., Baniecki, J. D., Ishii, M., Shioga, T., Kurihara, K. 2007; 101 (6)

    View details for DOI 10.1063/1.2511367

    View details for Web of Science ID 000245317700177

  • Fluorine incorporation at HfO2/SiO2 interfaces in high-k metal-oxide-semiconductor gate stacks: Local electronic structure APPLIED PHYSICS LETTERS Ha, J., Seo, K., McIntyre, P. C., Sarawat, K. C., Cho, K. 2007; 90 (11)

    View details for DOI 10.1063/1.2712785

    View details for Web of Science ID 000244959200069

  • Electrical properties of germanium/metal-oxide gate stacks with atomic layer deposition grown hafnium-dioxide and plasma-synthesized interface layers APPLIED PHYSICS LETTERS Sugawara, T., Oshima, Y., Sreenivasan, R., McIntyre, P. C. 2007; 90 (11)

    View details for DOI 10.1063/1.2472197

    View details for Web of Science ID 000244959200070

  • High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications APPLIED PHYSICS LETTERS Sreenivasana, R., Sugawara, T., Saraswat, K. C., McIntyre, P. C. 2007; 90 (10)

    View details for DOI 10.1063/1.2643085

    View details for Web of Science ID 000244791700042

  • Oxidation-enhanced interdiffusion in Si1-xGex/Si1-yGey superlattices APPLIED PHYSICS LETTERS Ozguven, N., McIntyre, P. C. 2007; 90 (8)

    View details for DOI 10.1063/1.2434162

    View details for Web of Science ID 000244420600047

  • First principles study of the HfO2/SiO2 interface: Application to high-k gate structures JOURNAL OF APPLIED PHYSICS Ha, J., McIntyre, P. C., Cho, K. (. 2007; 101 (3)

    View details for DOI 10.1063/1.2433696

    View details for Web of Science ID 000244250100087

  • ALD resist formed by vapor-deposited self-assembled monolayers LANGMUIR Hong, J., Porter, D. W., Sreenivasan, R., McIntyre, P. C., Bent, S. F. 2007; 23 (3): 1160-1165

    Abstract

    A new process of applying molecular resists to block HfO2 and Pt atomic layer deposition has been investigated. Monolayer films are formed from octadecyltrichlorosilane (ODTS) or tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS) and water vapor on native silicon oxide surfaces and from 1-octadecene on hydrogen-passivated silicon surfaces through a low-pressure chemical vapor deposition process. X-ray photoelectron spectroscopy data indicates that surfaces blocked by these monolayer resists can prevent atomic layer deposition of both HfO2 and Pt successfully. Time-dependent studies show that the ODTS monolayers continue to improve in blocking ability for as long as 48 h of formation time, and infrared spectroscopy measurements confirm an evolution of packing order over these time scales.

    View details for DOI 10.1021/la0606401

    View details for Web of Science ID 000243684100033

    View details for PubMedID 17241027

  • Atomic layer deposition of Y2O3/ZrO2 nanolaminates - A route to ultrathin solid-state electrolyte membranes ELECTROCHEMICAL AND SOLID STATE LETTERS Ginestra, C. N., Sreenivasan, R., Karthikeyan, A., Ramanathan, S., McIntyre, P. C. 2007; 10 (10): B161-B165

    View details for DOI 10.1149/1.2759606

    View details for Web of Science ID 000248659800003

  • Oxidation-Enhanced Interdiffusion in Si1-xGex Si1-yGey Superlattices Appl. Phys. Lett. Ozguven, N., McIntyre, P., C. 2007; 90: 082109-1-3
  • Metastability of Au−Ge Liquid Nanocatalysts: Ge Vapor–Liquid–Solid Nanowire Growth Far below the Bulk Eutectic Temperature ACS Nano Adhikari, H., Marshall, A., F., Goldthorpe, I., A., Chidsey, C., E. D., McIntyre, P., C. 2007; 1: 415-22
  • Atomic Layer Deposition of Y2O3/ZrO2 Nanolaminates: A Route to Ultrathin Solid-State Electrolyte Membranes Electrochem. Solid-State Lett. Ginestra, C., N., Sreenivasan, R., Karthikeyan, A., Ramanathan, S., McIntyre, P., C. 2007; 10: B161-65
  • Resistive switching mechanism in ZnxCd1-xS nonvolatile memory devices IEEE ELECTRON DEVICE LETTERS Wang, Z., Griffin, P. B., McVittie, J., Wong, S., McIntyre, P. C., Nishi, Y. 2007; 28 (1): 14-16

    View details for DOI 10.1109/LED.2006.887640

    View details for Web of Science ID 000243280900006

  • Chemical states and electrical properties of a high-k metal oxide/silicon interface with oxygen-gettering titanium-metal-overlayer APPLIED PHYSICS LETTERS Seo, K., Lee, D., Pianetta, P., Kim, H., Saraswat, K. C., McIntyre, P. C. 2006; 89 (14)

    View details for DOI 10.1063/1.2358834

    View details for Web of Science ID 000241056900088

  • Improvement in high-k (HfO2/SiO2) reliability by incorporation of fluorine IEEE ELECTRON DEVICE LETTERS Seo, K., Sreenivasan, R., McIntyre, P. C., Saraswat, K. C. 2006; 27 (10): 821-823

    View details for DOI 10.1109/LED.2006.882564

    View details for Web of Science ID 000240925900010

  • Effect of impurities on the fixed charge of nanoscale HfO2 films grown by atomic layer deposition APPLIED PHYSICS LETTERS Sreenivasan, R., McIntyre, P. C., Kim, H., Saraswat, K. C. 2006; 89 (11)

    View details for DOI 10.1063/1.2348735

    View details for Web of Science ID 000240545400096

  • High-efficiency metal-semiconductor-metal photodetectors on heteroepitaxially grown Ge on Si OPTICS LETTERS Okyay, A. K., Nayfeh, A. M., Saraswat, K. C., Yonehara, T., Marshall, A., McIntyre, P. C. 2006; 31 (17): 2565-2567

    Abstract

    We demonstrate extremely efficient germanium-on-silicon metal-semiconductor-metal photodetectors with responsivities (R) as high as 0.85 A/W at 1.55 microm and 2V reverse bias. Ge was directly grown on Si by using a novel heteroepitaxial growth technique, which uses multisteps of growth and hydrogen annealing to reduce surface roughness and threading dislocations that form due to the 4.2% lattice mismatch. Photodiodes on such layers exhibit reverse dark currents of 100 mA/cm2 and external quantum efficiency up to 68%. This technology is promising to realize monolithically integrated optoelectronics.

    View details for Web of Science ID 000240008700017

    View details for PubMedID 16902620

  • Nature of germanium nanowire heteroepitaxy on silicon substrates JOURNAL OF APPLIED PHYSICS Jagannathan, H., Deal, M., Nishi, Y., Woodruff, J., Chidsey, C., McIntyre, P. C. 2006; 100 (2)

    View details for DOI 10.1063/1.2219007

    View details for Web of Science ID 000239423400124

  • Nanoscale germanium MOS dielectrics - Part II: High-kappa gate dielectrics IEEE TRANSACTIONS ON ELECTRON DEVICES Chui, C. O., Kim, H., Chi, D., McIntyre, P. C., Saraswat, K. C. 2006; 53 (7): 1509-1516

    View details for DOI 10.1109/TED.2006.875812

    View details for Web of Science ID 000238621600002

  • Germanium nanowire epitaxy: Shape and orientation control NANO LETTERS Adhikari, H., Marshall, A. F., Chidsey, C. E., McIntyre, P. C. 2006; 6 (2): 318-323

    Abstract

    Epitaxial growth of nanowires along the 111 directions was obtained on Ge(111), Ge(110), Ge(001), and heteroepitaxial Ge on Si(001) substrates at temperatures of 350 degrees C or less by gold-nanoparticle-catalyzed chemical vapor deposition. On Ge(111), the growth was mostly vertical. In addition to 111 growth, 110 growth was observed on Ge(001) and Ge(110) substrates. Tapering was avoided by the use of the two-temperature growth procedure, reported earlier by Greytak et al.

    View details for DOI 10.1021/nl052231f

    View details for Web of Science ID 000235532700034

    View details for PubMedID 16464057

  • Atomic layer deposition of ultrathin metal-oxide films for nano-scale device applications JOURNAL OF THE KOREAN PHYSICAL SOCIETY Kim, H., McIntyre, P. C. 2006; 48 (1): 5-17

    View details for Web of Science ID 000234660100002

  • Nanoscale Germanium MOS Dielectrics - Part II: High-kapp Gate Dielectrics IEEE Trans. Electron Dev. Chui, C., O., Kim, H., Chi, D., McIntyre, P., C., Saraswat, K., C. 2006; 53: 1509-16
  • Chemical States and Electrical Properties of a High- k Metal Oxide/Silicon Interface with Oxygen-Gettering Titanium-Metal-Overlayer Appl. Phys. Lett. Seo, K, I., Lee, D, I., Pianetta, P., Kim, H., Saraswat, K., C., McIntyre, P., C. 2006; 89
  • Z-contrast and electron energy loss spectroscopy study of passive layer formation at ferroelectric PbTiO3/Pt interfaces APPLIED PHYSICS LETTERS Fu, L. F., Welz, S. J., Browning, N. D., Kurasawa, M., McIntyre, P. C. 2005; 87 (26)

    View details for DOI 10.1063/1.2144279

    View details for Web of Science ID 000234338700067

  • Photoemission studies of passivation of germanium nanowires APPLIED PHYSICS LETTERS Adhikari, H., McIntyre, P. C., Sun, S. Y., Pianetta, P., Chidsey, C. E. 2005; 87 (26)

    View details for DOI 10.1063/1.2158027

    View details for Web of Science ID 000234338700081

  • Effect of Y doping and composition-dependent elastic strain on the electrical properties of (Ba,Sr)TiO3 thin films deposited at 520 degrees C APPLIED PHYSICS LETTERS Wang, R. V., McIntyre, P. C., Baniecki, J. D., Nomura, K., Shioga, T., Kurihara, K., Ishii, M. 2005; 87 (19)

    View details for DOI 10.1063/1.2125113

    View details for Web of Science ID 000233058800053

  • Comparative study on electrical and microstructural characteristics of ZrO2 and HfO2 grown by atomic layer deposition JOURNAL OF MATERIALS RESEARCH Kim, H., Saraswat, K. C., McIntyre, P. C. 2005; 20 (11): 3125-3132

    View details for DOI 10.1557/JMR.2005.0394

    View details for Web of Science ID 000233095400032

  • Chemical states and electronic structure of a HfO2/Ge(001) interface APPLIED PHYSICS LETTERS Seo, K. I., McIntyre, P. C., Sun, S., Lee, D. I., Pianetta, P., Saraswat, K. C. 2005; 87 (4)

    View details for DOI 10.1063/1.2006211

    View details for Web of Science ID 000230725900045

  • Surface passivation and electronic structure characterization of PbTiO3 thin films and Pt/PbTiO3 interfaces JOURNAL OF APPLIED PHYSICS Kurasawa, M., McIntyre, P. C. 2005; 97 (10)

    View details for DOI 10.1063/1.1897073

    View details for Web of Science ID 000230168100109

  • Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification APPLIED PHYSICS LETTERS Chen, R., Kim, H., McIntyre, P. C., Porter, D. W., Bent, S. F. 2005; 86 (19)

    View details for DOI 10.1063/1.1922076

    View details for Web of Science ID 000229397900026

  • Structural, electronic, and dielectric properties of ultrathin zirconia films on silicon APPLIED PHYSICS LETTERS Sayan, S., Nguyen, N. V., Ehrstein, J., Emge, T., Garfunkel, E., Croft, M., Zhao, X. Y., Vanderbilt, D., Levin, I., Gusev, E. P., Kim, H., McIntyre, P. J. 2005; 86 (15)

    View details for DOI 10.1063/1.1864235

    View details for Web of Science ID 000228901600076

  • Formation of an interfacial Zr-silicate layer between ZrO2 and Si through in situ vacuum annealing APPLIED PHYSICS LETTERS Seo, K. I., McIntyre, P. C., Kim, H., Saraswat, K. C. 2005; 86 (8)

    View details for DOI 10.1063/1.1866644

    View details for Web of Science ID 000227609000054

  • Investigation of self-assembled monolayer resists for hafnium dioxide atomic layer deposition CHEMISTRY OF MATERIALS Chen, R., Kim, H., McIntyre, P. C., Bent, S. F. 2005; 17 (3): 536-544

    View details for DOI 10.1021/cm0486666

    View details for Web of Science ID 000226804000011

  • Misfit dislocation dissociation and Lomer formation in low mismatch SiGe/Si heterostructures JOURNAL OF MATERIALS RESEARCH Marshall, A. F., Aubertine, D. B., Nix, W. D., McIntyre, P. C. 2005; 20 (2): 447-455

    View details for DOI 10.1557/JMR.2005.0065

    View details for Web of Science ID 000229293000027

  • O-18 tracer diffusion in Pb(Zr,Ti)O-3 thin films: A probe of local oxygen vacancy concentration JOURNAL OF APPLIED PHYSICS Wang, R. V., McIntyre, P. C. 2005; 97 (2)

    View details for DOI 10.1063/1.1814813

    View details for Web of Science ID 000226700500022

  • Influence of Ge concentration and compressive biaxial stress on interdiffusion in Si-rich SiGe alloy heterostructures JOURNAL OF APPLIED PHYSICS Aubertine, D. B., McIntyre, P. C. 2005; 97 (1)

    View details for DOI 10.1063/1.1828240

    View details for Web of Science ID 000226700300039

  • O18 Tracer Diffusion in Pb(Zr,Ti)O3 Thin Films: A Probe of Local Oxygen Vacancy Concentration J. Appl. Phys. Wang, R., V., McIntyre, P., C. 2005; 97: 023508-1
  • Effect of Y Doping and Composition-Dependent Elastic Strain on the Electrical Properties of (Ba,Sr)TiO3 Thin Films Deposited at 520°C Appl. Phys. Lett. Wang, R, V., McIntyre, P., C., Baniecki, J., D., Nomura, K., Shioga, T., Kurihara, K. 2005; 87: 1-3
  • In situ low-angle x-ray scattering study of phase separation in initially mixed HfO2-SiO2 thin film interfaces APPLIED PHYSICS LETTERS Ha, J. H., CHI, D., McIntyre, P. C. 2004; 85 (24): 5884-5886

    View details for DOI 10.1063/1.1831554

    View details for Web of Science ID 000225620200023

  • Film and interface layer properties of ultraviolet-ozone oxidized hafnia and zirconia gate dielectrics on silicon substrates APPLIED PHYSICS LETTERS Chi, D., McIntyre, P. C. 2004; 85 (20): 4699-4701

    View details for DOI 10.1063/1.1814799

    View details for Web of Science ID 000225166400047

  • Interfacial characteristics of HfO2 grown on nitrided Ge (100) substrates by atomic-layer deposition APPLIED PHYSICS LETTERS Kim, H., McIntyre, P. C., Chui, C. O., Saraswat, K. C., Cho, M. H. 2004; 85 (14): 2902-2904

    View details for DOI 10.1063/1.1797564

    View details for Web of Science ID 000224547300076

  • Engineering chemically abrupt high-k metal oxide/silicon interfaces using an oxygen-gettering metal overlayer JOURNAL OF APPLIED PHYSICS Kim, H., McIntyre, P. C., Chui, C. O., Saraswat, K. C., Stemmer, S. 2004; 96 (6): 3467-3472

    View details for DOI 10.1063/1.1776636

    View details for Web of Science ID 000223720000069

  • Zirconia grown by ultraviolet ozone oxidation on germanium(100) substrates JOURNAL OF APPLIED PHYSICS Chi, D., Chui, C. O., Saraswat, K. C., Triplett, B. B., McIntyre, P. C. 2004; 96 (1): 813-819

    View details for DOI 10.1063/1.1745118

    View details for Web of Science ID 000222093300129

  • Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-kappa gate dielectrics APPLIED PHYSICS LETTERS Chen, R., Kim, H., McIntyre, P. C., Bent, S. F. 2004; 84 (20): 4017-4019

    View details for DOI 10.1063/1.1751211

    View details for Web of Science ID 000221269800021

  • Atomic layer deposition of high-kappa dielectric for germanium MOS applications-substrate surface preparation IEEE ELECTRON DEVICE LETTERS Chui, C. O., Kim, H., McIntyre, P. C., Saraswat, K. C. 2004; 25 (5): 274-276

    View details for DOI 10.1109/LED.2004.827285

    View details for Web of Science ID 000221180900016

  • Oxygen permeability of ferroelectric thin film top electrodes and its effect on detectable fatigue cycling-induced oxygen isotope motion JOURNAL OF MATERIALS RESEARCH Schloss, L. F., Kim, H., McIntyre, P. C. 2004; 19 (4): 1265-1272

    View details for DOI 10.1557/JMR.2004.0164

    View details for Web of Science ID 000222316400040

  • Crystallization kinetics and microstructure-dependent leakage current behavior of ultrathin HfO2 dielectrics: In situ annealing studies APPLIED PHYSICS LETTERS Kim, H., Marshall, A., McIntyre, P. C., Saraswat, K. C. 2004; 84 (12): 2064-2066

    View details for DOI 10.1063/1.1667621

    View details for Web of Science ID 000220268500018

  • Interfacial characteristics of HfO2 films grown on strained Si0.7Ge0.3 by atomic-layer deposition APPLIED PHYSICS LETTERS Cho, M. H., Chang, H. S., Moon, D. W., Kang, S. K., Min, B. K., Ko, D. H., Kim, H. S., McIntyre, P. C., Lee, J. H., Ku, J. H., Lee, N. I. 2004; 84 (7): 1171-1173

    View details for DOI 10.1063/1.1647703

    View details for Web of Science ID 000188880000048

  • Microstructural evolution of ZrO2-HfO2 nanolaminate structures grown by atomic layer deposition JOURNAL OF MATERIALS RESEARCH Kim, H. S., McIntyre, P. C., Saraswat, K. C. 2004; 19 (2): 643-650

    View details for Web of Science ID 000222316200037

  • Charge trapping studies on ultrathin ZrO2 and HfO2 high-k dielectrics grown by room temperature ultraviolet ozone oxidation APPLIED PHYSICS LETTERS Ramanathan, S., McIntyre, P. C., Guha, S., Gusev, E. 2004; 84 (3): 389-391

    View details for DOI 10.1063/1.1636532

    View details for Web of Science ID 000188114300027

  • Critical Current Angle-Dependent Measurements of Thin (15 nm) Chemically-Derived YBa2Cu3O7-d Films in Fields to 5.5 T Physica C Liebenberg, D., H., McIntyre, P., C., Cima, M., J., Francavilla, T., L. 2004; 235-240: 3069-70
  • Self-Assembled Monolayer Resist for Atomic Layer Deposition of HfO2 and ZrO2 High-k Gate Dielectrics Appl. Phys. Lett. Chen, R., Kim, H., McIntyre, P., C., Bent, S., F. 2004; 84: 4017-19
  • Crystallization Kinetics and Microstructure-Dependent Leakage Current Behavior of Ultrathin HfO2 Dielectrics: In Situ Annealing Studies Appl. Phys. Lett. Kim, H., Marshall, A., F., McIntyre, P., C., Saraswat, K., C. 2004; 84: 2064-66
  • Zirconia Grown by Ultraviolet Ozone Oxidation on Germanium (100) Substrates J. Appl. Phys. Chi, D., Chui, C., O., Saraswat, K., C., Triplett, B., B., McIntyre, P., C. 2004; 96: 813-19
  • Atomic Layer Deposition of High-k Dielectric for Germanium MOS Applications – Substrate IEEE Electron Dev. Lett. Chui, C., O., Kim, H., McIntyre, P., C., Saraswat, K., C. 2004; 25: 274-6
  • Origin and implications of the observed rhombohedral phase in nominally tetragonal Pb(Zr0.35Ti0.65)O-3 thin films JOURNAL OF APPLIED PHYSICS Kelman, M. B., McIntyre, P. C., Gruverman, A., Hendrix, B. C., Bilodeau, S. M., Roeder, J. F. 2003; 94 (8): 5210-5219

    View details for DOI 10.1063/1.1610773

    View details for Web of Science ID 000185664300075

  • Phase separation in hafnium silicates for alternative gate dielectrics - Influence on the unoccupied states JOURNAL OF THE ELECTROCHEMICAL SOCIETY Ramanathan, S., McIntyre, P. C., Luning, J., Lysaght, P. S., Yang, Y., Chen, Z. Q., Stemmer, S. 2003; 150 (10): F173-F177

    View details for DOI 10.1149/1.1604115

    View details for Web of Science ID 000185639800045

  • Local epitaxial growth of ZrO2 on Ge(100) substrates by atomic layer epitaxy APPLIED PHYSICS LETTERS Kim, H., Chui, C. O., Saraswat, K. C., McIntyre, P. C. 2003; 83 (13): 2647-2649

    View details for DOI 10.1063/1.1613031

    View details for Web of Science ID 000185521400049

  • Germanium nanowire field-effect transistors with SiO2 and high-kappa HfO2 gate dielectrics APPLIED PHYSICS LETTERS Wang, D. W., Wang, Q., Javey, A., Tu, R., Dai, H. J., Kim, H., McIntyre, P. C., Krishnamohan, T., Saraswat, K. C. 2003; 83 (12): 2432-2434

    View details for DOI 10.1063/1.1611644

    View details for Web of Science ID 000185333200044

  • Point defect distributions and their electrical effects on (Ba,Sr)TiO3/Pt thin films JOURNAL OF APPLIED PHYSICS Wang, R. V., McIntyre, P. C. 2003; 94 (3): 1926-1933

    View details for DOI 10.1063/1.1590063

    View details for Web of Science ID 000184400400094

  • Analysis of x-ray diffraction as a probe of interdiffusion in Si/SiGe heterostructures JOURNAL OF APPLIED PHYSICS Aubertine, D. B., Ozguven, N., McIntyre, P. C., Brennan, S. 2003; 94 (3): 1557-1564

    View details for DOI 10.1063/1.1589600

    View details for Web of Science ID 000184400400042

  • Effect of applied mechanical strain on the ferroelectric and dielectric properties of Pb(Zr0.35Ti0.65)O-3 thin films JOURNAL OF APPLIED PHYSICS Kelman, M. B., McIntyre, P. C., Hendrix, B. C., Bilodeau, S. M., Roeder, J. F. 2003; 93 (11): 9231-9236

    View details for DOI 10.1063/1.1569431

    View details for Web of Science ID 000183144300062

  • Ultraviolet-ozone oxidation of metal films JOURNAL OF THE ELECTROCHEMICAL SOCIETY Ramanathan, S., CHI, D., McIntyre, P. C., Wetteland, C. J., Tesmer, J. R. 2003; 150 (5): F110-F115

    View details for DOI 10.1149/1.1566416

    View details for Web of Science ID 000182184200052

  • Atomic layer deposition of ZrO2 on W for metal-insulator-metal capacitor application APPLIED PHYSICS LETTERS Lee, S. Y., Kim, H., McIntyre, P. C., Saraswat, K. C., Byun, J. S. 2003; 82 (17): 2874-2876

    View details for DOI 10.1063/1.1569985

    View details for Web of Science ID 000182399700043

  • Polarization recovery of fatigued Pb(Zr,Ti)O-3 thin films: Switching current studies JOURNAL OF APPLIED PHYSICS Schloss, L. F., McIntyre, P. C. 2003; 93 (3): 1743-1747

    View details for DOI 10.1063/1.1536019

    View details for Web of Science ID 000180630200065

  • Effects of crystallization on the electrical properties of ultrathin HfO2 dielectrics grown by atomic layer deposition APPLIED PHYSICS LETTERS Kim, H., McIntyre, P. C., Saraswat, K. C. 2003; 82 (1): 106-108

    View details for DOI 10.1063/1.1533117

    View details for Web of Science ID 000180134100036

  • Structural analysis of coexisting tetragonal and rhombohedral phases in polycrystalline Pb(Zr0.35Ti0.65)O-3 thin films JOURNAL OF MATERIALS RESEARCH Kelman, M. B., McIntyre, P. C., Hendrix, B. C., Bilodeau, S. M., Roeder, J. F. 2003; 18 (1): 173-179

    View details for Web of Science ID 000180363400024

  • Polarization Recovery of Fatigued Pb(Zr,Ti)O3 Thin Films: Switching Current Studies J. Appl. Phys. Schloss, L., F., McIntyre, P., C. 2003; 93: 1743-47
  • Effect of Applied Mechanical Strain on the Ferroelectric and Dielectric Properties of Pb(Zr0.35Ti0.65)O3 Thin Films J. Appl. Phys. Kelman, M., B., McIntyre, P., C., Hendrix, B., C., Bilodeau, S., M., Roeder, J., F. 2003; 93: 9231-36
  • Structural Analysis of Coexisting Tetragonal and Rhombohedral Phases in Polycrystalline Pb(Zr0.35Ti 0.65)O3 Thin Films J. Mater. Res. Kelman, M., B., McIntyre, P., C., Hendrix, B., C., Bilodeau, S., M., Roeder, J., F., Brennan, S. 2003; 18: 173-9
  • Local Epitaxial Growth of ZrO2 on Ge (100) Substrates by Atomic Layer Epitaxy Appl. Phys. Lett. Kim, H., Chui, C., O., Saraswat, K., C., McIntyre, P., C. 2003; 83: 2647-49
  • Phase Separation in Hafnium Silicates for Alternative Gate Dielectrics: Influence on the Unoccupied States J. Electrochem. Soc. Ramanathan, S., McIntyre, P., C., Luning, J., Lysaght, P., S., Yang, Y., Chen, Z., Q 2003; 150: F173-77
  • Germanium Nanowire Field-Effect Transistors with SiO2 and High-k HfO2 Gate Dielectrics Appl. Phys. Lett. Wang, D., W., Wang, Q., Javey, A., Tu, R., Dai, H., J, Kim, H., McIntyre, P. 2003; 83: 2432-34
  • High-kappa dielectrics for advanced carbon-nanotube transistors and logic gates NATURE MATERIALS Javey, A., Kim, H., Brink, M., Wang, Q., Ural, A., Guo, J., McIntyre, P., McEuen, P., Lundstrom, M., DAI, H. J. 2002; 1 (4): 241-246

    Abstract

    The integration of materials having a high dielectric constant (high-kappa) into carbon-nanotube transistors promises to push the performance limit for molecular electronics. Here, high-kappa (approximately 25) zirconium oxide thin-films (approximately 8 nm) are formed on top of individual single-walled carbon nanotubes by atomic-layer deposition and used as gate dielectrics for nanotube field-effect transistors. The p-type transistors exhibit subthreshold swings of S approximately 70 mV per decade, approaching the room-temperature theoretical limit for field-effect transistors. Key transistor performance parameters, transconductance and carrier mobility reach 6,000 S x m(-1) (12 microS per tube) and 3,000 cm2 x V(-1) x s(-1) respectively. N-type field-effect transistors obtained by annealing the devices in hydrogen exhibit S approximately 90 mV per decade. High voltage gains of up to 60 are obtained for complementary nanotube-based inverters. The atomic-layer deposition process affords gate insulators with high capacitance while being chemically benign to nanotubes, a key to the integration of advanced dielectrics into molecular electronics.

    View details for DOI 10.1038/nmat769

    View details for Web of Science ID 000181498800022

    View details for PubMedID 12618786

  • Spinodal decomposition in amorphous metal-silicate thin films: Phase diagram analysis and interface effects on kinetics JOURNAL OF APPLIED PHYSICS Kim, H., McIntyre, P. C. 2002; 92 (9): 5094-5102

    View details for DOI 10.1063/1.1510590

    View details for Web of Science ID 000178767200035

  • Observation and modeling of the initial fast interdiffusion regime in Si/SiGe multilayers JOURNAL OF APPLIED PHYSICS Aubertine, D. B., Mander, M. A., Ozguven, N., Marshall, A. F., McIntyre, P. C., Chu, J. O., Mooney, P. M. 2002; 92 (9): 5027-5035

    View details for DOI 10.1063/1.1508424

    View details for Web of Science ID 000178767200026

  • Oxygen tracer studies of ferroelectric fatigue in Pb(Zr,Ti)O-3 thin films APPLIED PHYSICS LETTERS Schloss, L. F., McIntyre, P. C., Hendrix, B. C., Bilodeau, S. M., Roeder, J. F., Gilbert, S. R. 2002; 81 (17): 3218-3220

    View details for DOI 10.1063/1.1516628

    View details for Web of Science ID 000178624900034

  • Effects of long-time DC bias on D2O- and D-2/N-2-annealed BST thin films JOURNAL OF ELECTROCERAMICS Wang, R. V., Becker, R. J., McIntyre, P. C. 2002; 9 (1): 25-30

    View details for Web of Science ID 000179916000003

  • Structural studies of ultrathin zirconia dielectrics PHILOSOPHICAL MAGAZINE LETTERS Ramanathan, S., McIntyre, P. C., Luning, J., Pianetta, P., Muller, D. A. 2002; 82 (9): 519-528

    View details for DOI 10.1080/09500830210157108

    View details for Web of Science ID 000177786400007

  • Thermal stability of polycrystalline silicon electrodes on ZrO2 gate dielectrics APPLIED PHYSICS LETTERS Perkins, C. M., Triplett, B. B., McIntyre, P. C., Saraswat, K. C., Shero, E. 2002; 81 (8): 1417-1419

    View details for DOI 10.1063/1.1499513

    View details for Web of Science ID 000177351600017

  • Germanium MOS capacitors incorporating ultrathin high-kappa gate dielectric IEEE ELECTRON DEVICE LETTERS Chui, C. O., Ramanathan, S., Triplett, B. B., McIntyre, P. C., Saraswat, K. C. 2002; 23 (8): 473-475

    View details for DOI 10.1009/LED.2002.801319

    View details for Web of Science ID 000177207300010

  • Ultrathin zirconia/SiO2 dielectric stacks grown by ultraviolet-ozone oxidation APPLIED PHYSICS LETTERS Ramanathan, S., McIntyre, P. C. 2002; 80 (20): 3793-3795

    View details for DOI 10.1063/1.1481241

    View details for Web of Science ID 000175564100043

  • Electrical properties of thin film zirconia grown by ultraviolet ozone oxidation JOURNAL OF APPLIED PHYSICS Ramanathan, S., Park, C. M., McIntyre, P. C. 2002; 91 (7): 4521-4527

    View details for DOI 10.1063/1.1459103

    View details for Web of Science ID 000174663900087

  • Thickness-dependent phase evolution of polycrystalline Pb(Zr0.35Ti0.65)O-3 thin films APPLIED PHYSICS LETTERS Kelman, M. B., Schloss, L. F., McIntyre, P. C., Hendrix, B. C., Bilodeau, S. M., Roeder, J. F. 2002; 80 (7): 1258-1260

    View details for DOI 10.1063/1.1449532

    View details for Web of Science ID 000173896400050

  • Thickness-Dependent Phase Evolution of Polycrystalline Pb(Zr0.35Ti0.65)O3 Thin Films Appl. Phys. Lett. Kelman, M., B., Schloss, L., F., McIntyre, P., C., Hendrix, B., C., Bilodeau, S., M., Roeder, J., F. 2002; 80: 1258-60
  • Effects of Long-Time DC Bias on D2O- and D2/N2-Annealed BST Thin Films J. Electroceramics Wang, R., V., Becker, R., J., McIntyre, P., C. 2002; 9: 25-30
  • Thermal Stability of Polycrystalline Silicon Electrodes on ZrO2 Gate Dielectrics Appl. Phys. Lett. Perkins, C., M., Triplett, B., B., McIntyre, P., C., Saraswat, K., C., Shero, E. 2002; 81: 1417-19
  • High-k Dielectrics for advanced Carbon-Nanotube Transistors and Logic Gates Nature Mater. Javey, A., Kim, H., Brink, M., Wang, Q., Ural, A., Guo, J., McIntyre, P. 2002; 1: 241-46
  • Germanium MOS Capacitors Incorporating Ultrathin High-K Gate Dielectric IEEE Electron Dev. Lett. Chui, C., O., Ramanathan, S., Triplett, B., B., McIntyre, P., C., Saraswat, K., C. 2002; 23: 473-75
  • Oxygen Tracer Studies of Ferroelectric Fatigue in Pb(Zr,Ti)O3 Thin Films Appl. Phys. Lett. Schloss, L., F., McIntyre, P., C., Hendrix, B., C., Bilodeau, S., M., Roeder, J., F., Gilbert, S., R. 2002; 81: 3218-20
  • Effect of oxygen stoichiometry on the electrical properties of zirconia gate dielectrics APPLIED PHYSICS LETTERS Ramanathan, S., Muller, D. A., Wilk, G. D., Park, C. M., McIntyre, P. C. 2001; 79 (20): 3311-3313

    View details for Web of Science ID 000172046800033

  • Growth and characterization of ultrathin zirconia dielectrics grown by ultraviolet ozone oxidation APPLIED PHYSICS LETTERS Ramanathan, S., Wilk, G. D., Muller, D. A., Park, C. M., McIntyre, P. C. 2001; 79 (16): 2621-2623

    View details for Web of Science ID 000171466200040

  • Microstructural study of epitaxial platinum and permalloy/platinum films grown on (0001) sapphire PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES Ramanathan, S., Clemens, B. M., McIntyre, P. C., Dahmen, U. 2001; 81 (8): 2073-2094

    View details for Web of Science ID 000170354500013

  • Point defect equilibrium in strontium titanate thin films JOURNAL OF APPLIED PHYSICS McIntyre, P. C. 2001; 89 (12): 8074-8084

    View details for Web of Science ID 000169183500063

  • Deuterium in (Ba,Sr)TiO3 thin films: Kinetics and mechanisms of incorporation and removal during annealing JOURNAL OF APPLIED PHYSICS McIntyre, P. C., Ahn, J. H., Becker, R. J., Wang, R. V., Gilbert, S. R., Mirkarimi, L. W., Schulberg, M. T. 2001; 89 (11): 6378-6388

    View details for Web of Science ID 000169149900080

  • Electrical and materials properties of ZrO2 gate dielectrics grown by atomic layer chemical vapor deposition APPLIED PHYSICS LETTERS Perkins, C. M., Triplett, B. B., McIntyre, P. C., Saraswat, K. C., Haukka, S., Tuominen, M. 2001; 78 (16): 2357-2359

    View details for Web of Science ID 000168275200031

  • Dielectric relaxation and steady-state leakage in low-temperature sputtered (Ba, Sr)TiO3 thin films JOURNAL OF APPLIED PHYSICS Werner, M. C., Banerjee, I., Zhang, R., McIntyre, P. C., Tani, N., Tanimura, M. 2001; 89 (4): 2309-2313

    View details for Web of Science ID 000166688300049

  • Deuterium-induced degradation of (Ba, Sr)TiO3 films APPLIED PHYSICS LETTERS Ahn, J. H., McIntyre, P. C., Mirkarimi, L. W., Gilbert, S. R., Amano, J., Schulberg, M. 2000; 77 (9): 1378-1380

    View details for Web of Science ID 000088900900047

  • Microstructure of (Ba,Sr)TiO3 thin films deposited by physical vapor deposition at 480 degrees C and its influence on the dielectric properties APPLIED PHYSICS LETTERS Werner, M. C., Banerjee, I., McIntyre, P. C., Tani, N., Tanimura, M. 2000; 77 (8): 1209-1211

    View details for Web of Science ID 000088791600048

  • Equilibrium point defect and electronic carrier distributions near interfaces in acceptor-doped strontium titanate JOURNAL OF THE AMERICAN CERAMIC SOCIETY McIntyre, P. C. 2000; 83 (5): 1129-1136

    View details for Web of Science ID 000087329000020

  • Properties of Ferroelectric Films at Small Dimensions Ann. Rev. Mater. Sci. Shaw, T., M., Trolier-McKinstry, S., McIntyre, P., C. 2000; 30: 263-98
  • Deuterium-Induced Degradation of (Ba,Sr)TiO3 Thin Films Appl. Phys. Lett. Ahn, J., H., McIntyre, P., C., Mirkarimi, L., W., Gilbert, S., R., Amano, J., Schulberg, M. 2000; 77: 1378-80
  • Microstructure of (Ba,Sr)TiO3 Thin Films Deposited by Physical Vapor Deposition at 480°C and Its Influence on the Dielectric Properties Appl. Phys. Lett. Werner, M., C., Banerjee, I., McIntyre, P., C., Tani, N., Tanimura, M. 2000; 77: 1209-11
  • The properties of ferroelectric films at small dimensions ANNUAL REVIEW OF MATERIALS SCIENCE Shaw, T. M., Trolier-McKinstry, S., McIntyre, P. C. 2000; 30: 263-298

    View details for Web of Science ID 000089332400011

  • Interdiffusion in Epitaxial Co/Pt Multilayers J. Appl. Phys. McIntyre, P., C., Wu, D., T., Nastasi, M. 1997; 81: 637-45
  • Oxidation Kinetics of TiN Layers: Exposed and Beneath Pt Thin Films Appl. Phys. Lett. McIntyre, P., C., Summerfelt, S., R., Maggiore, C., J. 1997; 70: 711-13
  • Epitaxy of Pt Thin Films on (001) MgO. I. Interface Energetics and Misfit Accommodation Acta Mater. McIntyre, P., C., Maggiore, C., J., Nastasi, M. 1997; 45: 869-78
  • Epitaxy of Pt Thin Films on (001) MgO. II. Orientation Evolution from Nucleation through Coalescence Acta Mater. McIntyre, P., C., Maggiore, C., J., Nastasi, M. 1997; 45: 879-87
  • Kinetics and Mechanisms of TiN Oxidation Beneath Pt Thin Films J. Appl. Phys. McIntyre, P., C., Summerfelt, S., R. 1997; 82: 4577-85
  • Transmission Electron Microscopy Investigation of Biaxial Alignment Development in YSZ Films Fabricated Using Ion Beam Assisted Deposition J. Vac. Sci. Technol. A McIntyre, P., C., Ressler, K., G., Sonnenberg, N., Cima, M., J. 1996; 14: 210-15
  • Ion-beam-induced epitaxial crystallization of sol-gel zirconia thin films on yttria-stabilized zirconia Phil. Mag. Lett. Yu, N., McIntyre, P., C., Levine, T., E., Giannelis, E., P., Mayer, J., W., Nastasi, M. 1996; 73: 359-68
  • Increased Wear Resistance of Electrodeposited Chromium through Applications of Plasma Source Ion Implantation Techniques Surf. Coatings Technol. Walter, K., C., Scheuer, J., T., McIntyre, P., C., Kodali, P., Yu, N., Nastasi, M. 1996; 85: 1-6
  • Nanocrystalline BaTiO3 from Freeze-Dried Nitrate Solutions J. Mater. Res. McHale, J., M., McIntyre, P., C., Sickafus, K., E., Coppa, N., V. 1996; 11: 1199-209
  • Microstructure Development of Sol-Gel Derived Epitaxial LiNbO3 Thin Films J. Mater. Res. Nashimoto, K., Cima, M., J., McIntyre, P., C., Rhine, W., E. 1995; 10: 2564-72
  • Orientation Selection in Thin Platinum Films on (100) MgO J. Appl. Phys. McIntyre, P., C., Maggiore, C., J., Nastasi, M. 1995; 77: 6201-4
  • Doping Effects on the Kinetics of Solid-Phase Epitaxial-Growth of Amorphous Alumina Thin-Films on Sapphire Appl. Phys. Lett. Yu, N., Simpson, T., W., McIntyre, P., C., Nastasi, M., Mitchell, I., V. 1995; 67: 924-26
  • High-Quality Epitaxial Growth of Gamma-Alumina films on Alpha-Alumina Sapphire Induced by Ion-Beam Bombardment Phys. Rev. B Yu, N., McIntyre, P., C., Nastasi, M., Sickafus, K., E. 1995; 52: 17518-22
  • Defect Formation in Epitaxial Oxide Dielectric Layers Due to Substrate Surface Relief J. Electron. Mater. McIntyre, P., C., Chang, B., P., Sonnenberg, N., Cima, M., J. 1995; 24: 735-45
  • Effects of Substrate Surface Steps on the Microstructure of Epitaxial Ba2YCu3O7-x Thin Films on (001) LaAlO3 J. Crystal Growth McIntyre, P., C., Cima, M., J., Roshko, A. 1995; 149: 64-73
  • Current-Voltage Measurements of Thin YBa2Cu3O6.9 Films Compared with a Modified Ambegaokar-Halperin Theory Phys. Rev. B Liebenberg, D., H., Soulen, R., J., Francavilla, T., L., Fullermora, W., W., McIntyre, P., C., Cima, M., J. 1995; 51: 11838-47
  • Formation of Iron or Chromium Doped Epitaxial Sapphire Thin Films on Sapphire Substrates J. Appl. Phys. Yu, N., Wen, Q., Z., Clarke, D., R., McIntyre, P., C., Kung, H., Nastasi, M. 1995; 78: 5412-21
  • Epitaxial Nucleation and Growth of Chemically Derived Ba2YCu3O7-x Thin Films on (001) SrTiO3 J. Appl. Phys. McIntyre, P., C., Cima, M., J., Roshko, A. 1995; 77: 5263-72
  • Heteroepitaxial Growth of Chemically Derived Ex Situ Ba2YCu3O7-x Thin Films J. Mater. Res. McIntyre, P., C., Cima, M., J. 1994; 9: 2219-30
  • Angular Dependence of Transport Current Near Critical at Fields to 4 T in Metalorganic Thin Films J. Superconductivity Liebenberg, D., H., Cima, M., J., McIntyre, P., C., Francavilla, T., L. 1994; 7: 303-8
  • Microstructural Inhomogeneities in Chemically Derived Ba2YCu3O7-x Thin Films: Implications for Flux Pinning J. Mater. Res. McIntyre, P., C., Cima, M., J. 1994; 9: 2778-88
  • Preparation of Biaxially Aligned Cubic Zirconia Films on Pyrex Glass Substrates Using Ion-Beam Assisted Deposition J. Appl. Phys. Sonnenberg, N., Longo, A., S., Cima, M., J., Chang, B., P., Ressler, K., G., McIntyre, P., C. 1993; 74: 1027-34
  • Comparison of the Surface Morphology and Microstructure of In Situ and Ex Situ Derived YBa2Cu3O7-x Thin Films J. Electron Mater. Westerheim, A., C., McIntyre, P., C., Basu, S., N., Bhatt, D., Yu-Jahnes, L., S., Anderson, A., C. 1993; 22: 1113-20
  • Effect of growth conditions on the properties and morphology of chemically derived epitaxial thin films of Ba2YCu3O7-x on (001) LaAlO3 J. Appl. Phys. McIntyre, P., C., Cima, M., J., Smith, J., A., Hallock, R., B., Siegal, M., P., Phillips, J., M. 1992; 71: 1868-77
  • Angular Dependence of Critical Currents of High Temperature Superconducting Films in High Magnetic Fields Prepared by Metalorganic Deposition Cryogenics Liebenberg, D., H., McIntyre, P., C., Cima, M., J., Francavilla, T., L. 1992; 32: 1066-70
  • Mixed-State Behavior in Large Magnetic Fields of High-Temperature Superconducting Films Prepared by Metalorganic Deposition Appl. Phys. Lett. McIntyre, P., C., Cima, M., J., Liebenberg, D., H., Francavilla, T., L. 1991; 58: 2033-35
  • Metalorganic Deposition of High-Jc Ba2YCu3O7-x Thin-Films from Trifluoracetate Precursors onto (100) SrTiO3 J. Appl. Phys. McIntyre, P., C., Cima, M., J., Ng, M., F. 1990; 68: 4183-87
  • Texture development in Ba2YCu3O7-x Films from Trifluoroacetate Precursors J. Mater. Res. McIntyre, P., C., Cima, M., J., Ng, M., F., Chiu, R., C., Rhine, W., E. 1990; 5: 2771-79
  • ELECTRON-BEAM FOR THE FERMILAB ELECTRON COOLING EXPERIMENT IEEE TRANSACTIONS ON NUCLEAR SCIENCE Herrmannsfeldt, W. B., Kells, W., McIntyre, P. M., Mills, F., MISEK, J., OLEKSIUK, L. 1979; 26 (3): 3237-3240

    View details for Web of Science ID A1979HB52100085

  • PHASE SPACE COOLING AND PP COLLIDING BEAMS OF FERMILAB IEEE TRANSACTIONS ON NUCLEAR SCIENCE Gray, E. R., Johnson, D. E., Huson, F. R., Mills, F. E., Teng, L. C., TOOL, G. S., McIntyre, P. M., RUBBIA, C., Herrmannsfeldt, W. B., Cline, D. B., RHODES, T. G. 1977; 24 (3): 1854-1856

    View details for Web of Science ID A1977DL67400288

Conference Proceedings

  • Admittance and subthreshold characteristics of atomic-layer-deposition Al2O3 on In0.53Ga0.47As in surface and buried channel flatband metal-oxide-semiconductor field effect transistors Paterson, G. W., Bentley, S. J., Holland, M. C., Thayne, I. G., Ahn, J., Long, R. D., McIntyre, P. C., Long, A. R. AMER INST PHYSICS. 2012

    View details for DOI 10.1063/1.4720940

    View details for Web of Science ID 000305363700119

  • In-Situ As2 Decapping and Atomic Layer Deposition of Al2O3 on n-InGaAs(100) Ahn, J., Shin, B., McIntyre, P., C. 2012
  • Undoped Ge Core-Si(Ge) Shell Nanowires: Synthesis, Local Composition and Strain Hu, S., Goldthorpe, I., A., Marshall, A., F., McIntyre, P., C. 2012
  • Mechanism of Dangling Bond Elimination on As-rich InGaAs Surface Melitz, W., Chagarov, E., Kent, T., Kummel, A., C., Droopad, R., Ahn, J., McIntyre, P. 2012
  • III-V nMOSFETs - Some issues associated with roadmap worthiness (invited) Thayne, I., Bentley, S., Holland, M., Jansen, W., Li, X., Macintyre, D., Thoms, S., Shin, B., Ahn, J., McIntyre, P. ELSEVIER SCIENCE BV. 2011: 1070-1075

    View details for DOI 10.1016/j.mee.2011.03.100

    View details for Web of Science ID 000292572700008

  • In Situ XPS in Atomic Layer Deposition of Oxides on Ge (100) Swaminathan, S., McIntyre, P., C. 2010
  • Nanowires for Energy Applications: Fundamental Growth Studies Marshall, A. F., Goldthorpe, I. A., Koto, M., McIntyre, P. C., Zhu, J., Peng, H., Barnett, D. M., Nix, W. D., Cui, Y. CAMBRIDGE UNIV PRESS. 2009: 144-145

    View details for DOI 10.1017/S1431927609094641

    View details for Web of Science ID 000208119100072

  • Interface studies of ALD-grown metal oxide insulators on Ge and III-V semiconductors McIntyre, P. C., Oshima, Y., Kim, E., Saraswat, K. C. ELSEVIER SCIENCE BV. 2009: 1536-1539

    View details for DOI 10.1016/j.mee.2009.03.081

    View details for Web of Science ID 000267460100004

  • Group IV semiconductor nanowire arrays: Different flavors of epitaxy McIntyre, P., C., Adhikari, H., Goldthorpe, I., A., Marshall, A., F., Chidsey, C., E. D. 2009
  • Bulk and Interfacial Oxygen Defects in HfO2 Gate Dielectric Stacks: A Critical Assessment McIntyre, P., C. 2007
  • Oxygen Transfer from Metal Gate to High-k Gate Dielectric Stack: Interface Structure & Property Changes Ha, J., AlShareef, H., Chambers, J., Sun, Y., Pianetta, P., McIntyre, P. 2007
  • Physical and electrical properties of plasma nitrided germanium oxynitride Sugawara, T., Sreenivasan, R., McIntyre, P. C. A V S AMER INST PHYSICS. 2006: 2449-2456

    View details for DOI 10.1116/1.234886

    View details for Web of Science ID 000241476500046

  • Mechanism of germanium plasma nitridation Sugawara, T., Sreenivasan, R., McIntyre, P. C. A V S AMER INST PHYSICS. 2006: 2442-2448

    View details for DOI 10.1116/1.2348887

    View details for Web of Science ID 000241476500045

  • Strain Enhanced High Efficiency Germanium Photodetectors in the Near Infrared for Integration with Si Okyay, A., K., Nayfeh, A., M., Saraswat, K., C, Ozguven, N., Marshall, A., McIntyre, P., C. 2006
  • Effects of Nitrogen Reactive Species on Germanium Plasma Nitridation Processes Sugawara, T., Sreenivasan, R., McIntyre, P., C. 2006
  • Interface Layers for High-k/Ge Gate Stacks: Are They Necessary? McIntyre, P., C., Chi, D., Chui, C., O., Kim, H., Seo, K., I., Saraswat, K., C. 2006
  • High Performance Barium Strontium Titanate Thin Film Capacitors for Decoupling Applications Kamehara, N., Kurihara, K., Baniecki, J., D., Shioga, T., Nomura, K., McIntyre, P., C. 2006
  • Area Selective Atomic Layer Deposition by Soft Lithography Chen, R., Porter, D., W., Kim, H., McIntyre, P., C., Bent, S., F. 2006
  • Structural Evolution and Point Defects in Metal Oxide-Based High-k Gate Dielectrics McIntyre, P., C., Kim, H., Saraswat, K., C. 2006
  • Self-assembled monolayers as resists for atomic layer deposition Chen, R., Kim, H., Porter, D. W., McIntyre, P. C., Bent, S. F. AMER CHEMICAL SOC. 2005: U1193-U1194

    View details for Web of Science ID 000236797302400

  • Ge based high performance nanoscale MOSFETs Saraswat, K. C., Chui, C. O., Krishnamohan, T., Nayfeh, A., McIntyre, P. ELSEVIER SCIENCE BV. 2005: 15-21

    View details for DOI 10.1016/j.mee.2005.04.038

    View details for Web of Science ID 000231517000005

  • Y-Doping Effects on the Dielectric Behavior of RF-Sputtered BST Thin Films Wang, R., V., McIntyre, P., C., Baniecki, J., D., Nomura, K., Takeshi, S., Kurihara, K. 2005
  • Experimental Study of Biaxial and Uniaxial Strain Effects on Carrier Mobility in Bulk and Ultrathin-Body SOI MOSFETs Uchida, K., Zednik, R., Lu, C., H., Jagannathan, H., McVittie, J., McIntyre, P., C. 2004
  • Controlling Area-Selective Atomic Layer Deposition of HfO2 Dielectric by Self-Assembled Monolayers Chen, R., Kim, H., McIntyre, P., C., Bent, S., F. 2004
  • Interdiffusion in Coherent Si0.70Ge0.30/Si0.95Ge0.05 Superlattices Aubertine, D., B., McIntyre, P., C. 2003
  • A Germanium NMOSFET Process Integrating Metal Gate and Improved Hi-k Dielectrics Chui, C., O., Kim, H., McIntyre, P., C., Saraswat, K., C. 2003
  • A Novel Self-Aligned Gate-Last MOSFET Process Comparing High-k Candidates Chui, C., O., Kim, H., McVittie, J., P., Triplett, B., B, McIntyre, P., C., Saraswat, K., C. 2003
  • Assessment of Silicon MOS and Carbon Nanotube FET Performance Limits Using a General Theory of Ballistic Transistors Guo, J., Datta, S., Lundstrom, M., Brink, M., McEuen, P., Javey, A., McIntyre, P. 2002
  • Room Temperature Grown Zirconia/SiO2 Dielectric Stacks with 1 nm EOT Ramanathan, S., McIntyre, P., C. 2002
  • Ultrathin High-k Gate Dielectric Technology for Germanium MOS Applications Chui, C., O., Kim, H., Chi, D., Triplett, B., B., McIntyre, P., C., Saraswat, K., C. 2002
  • Interpretation of ion channeling results from epitaxial Pt thin films and Co/Pt multilayers McIntyre, P. C., Maggiore, C. J., Nastasi, M. ELSEVIER SCIENCE BV. 1998: 214-219

    View details for Web of Science ID 000074380400036

  • Ir-Electroded BST Thin Film Capacitors for 1 Giga-Bit DRAM Application Chen, T, S., Hadad, D., Balu, V., Jiang, B., Kuah, S, H., McIntyre, P., C. 1996
  • Crystallization Kinetics of Fe-Doped Al2O3 Simpson, T., W., Mitchell, I., V., Yu, N., Nastasi, M., McIntyre, P., C. 1995
  • The Influence of Processing Parameters on the Development of Biaxially Aligned Zirconia Thin Films Deposited by Ion Beam Assisted Deposition Sonnenberg, N., Ressler, K., G., McIntyre, P., C., Cima, M., J. 1995
  • Orientation Selection and Microstructural Evolution of Epitaxial Pt Films on (001) MgO McIntyre, P., C., Maggiore, C., J., Nastasi, M. 1995
  • Epitaxial Dielectric Planarization for Multilayer HTSC Structures Chang, B., P., McIntyre, P., C., Sonnenberg, N., Cima, M., J. 1995
  • Epitaxial Planarization Using Ion Beam Assisted Deposition Chang, B., P., Sonnenberg, N., McIntyre, P., C., Cima, M., J., Sun, J., Yu-Jahnes, L., S. 1994
  • Microstructural Evolution During Epitaxial Growth of Chemically Derived Ba2YCu3O7-x Thin Films McIntyre, P., C., Cima, M., J. 1993
  • Metalorganic Deposition of High-Jc Ba2YCu3O7-x Thin Films on Single Crystal Substrates Cima, M., J., McIntyre, P., C., Smith Jr., J., A. 1991