Plasma Technology for Advanced Devices

Last update: June 7, 2013

 

11/24/12: Ion-ion plasmas

 

08/06/12: Helicon references

 

04/28/12: Plasma etch challenges for FinFET transistors

 

08/31/10: HP and Hynix to commercialize ReRAM

 

08/31/10: Toshiba announces 24 nm NAND flash

 

07/19/10: Soft Plasmas for Monolayer Etching

 

06/30/10: Barrier to faster integrated circuits may be mere speed bump

 

12/20/09: Curing of 193 nm resists

 

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